Laboratory & Cleanroom
Our facility consists of 250m2 cleanroom and 460m2 dedicated lab space for R&D wafer-level processing. Beyond material synthesis (quantum dots), our current processing capabilities include: atomic layer deposition (ALD), physical vapor deposition (PVD), lithography, wire-bonding, and quantum dot deposition using various techniques.
Wafer-level Processing
For customers and partners looking to seamlessly integrate our technology into their existing processes, we offer the option to work with us as a supplier of both materials and technology. Our solution-processable quantum dot material allows for an easy implementation across various operations.
Additionally, our facilities can be used for specialised projects, with manufacturing capabilities to process both CMOS image sensors and TFT panels.
Key features of our quantum dot wafer-level processing
Versatility & Customisation
Compatible with various substrate materials and capable of integrating with existing semiconductor processes, our quantum dot technology is versatile and adaptable. We are able to tailor the optical and electronic properties of our quantum dots to meet the precise specifications of your desired application.
Scalable Production
From small R&D projects to larger commercial productions, our facility is fully equipped to handle any volume with the highest standards.
High Yield & Low Defect Rates
Our advanced processing techniques minimise defects while maximising yield and ensuring superior product performance.
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